Postdoctoral Researcher in the Development of Thin Films and Deposition Processes using Artificial Intelligence and Autonomous Experiments.

The focus of this position is to use advanced PVD processes to develop state-of-the art thin films, such as piezoelectric and ferroelectric nitrides. You will use synchronized HiPIMS processes to tune the properties and performance of the films. The experiments will be informed by in-situ surface and interface analysis. 

Your work will make use of our group's unique comprehensive infrastructure for materials and device characterization. In addition, the work will benefit from a unique self-driving thin-film laboratory. This laboratory is currently in development and will include sputter deposition and in-situ surface analysis techniques such as RHEED, AES and XPS. Part of the work is also to optimize the workflows in this laboratory in collaboration with the team.

The ability to collaborate in a multidisciplinary research environment is essential. Personal initiative, ability to work systematically, reliability, responsibility, teamwork and communication skills are a must.

The contract duration is initially for two years with the possibility of extension and a long-term perspective in the team. The position is available from 1 December 2026 or later upon agreement.